The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
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The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
Filmes finos poliméricos podem ser preparados por deposição física de vapor de várias maneiras, como evaporação direta do polímero, co-evaporação de dois monômeros seguida por reação de poliadição ou policondensação, ou evaporação de um único monômero seguida de polimerização em cadeia. A deposição assistida por ionização (IAD) foi proposta como um novo método de deposição de polímeros que possui características especiais como ativação da reação de polimerização e alinhamento da orientação dipolo. Esses mecanismos foram utilizados para a formação de filmes finos de polímero vinílico e poliureia visando aplicações como diodos emissores de luz orgânicos e dispositivos piezoelétricos.
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Hiroaki USUI, "Deposition of Polymeric Thin Films by Ionization-Assisted Method" in IEICE TRANSACTIONS on Electronics,
vol. E83-C, no. 7, pp. 1128-1133, July 2000, doi: .
Abstract: Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/e83-c_7_1128/_p
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@ARTICLE{e83-c_7_1128,
author={Hiroaki USUI, },
journal={IEICE TRANSACTIONS on Electronics},
title={Deposition of Polymeric Thin Films by Ionization-Assisted Method},
year={2000},
volume={E83-C},
number={7},
pages={1128-1133},
abstract={Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.},
keywords={},
doi={},
ISSN={},
month={July},}
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TY - JOUR
TI - Deposition of Polymeric Thin Films by Ionization-Assisted Method
T2 - IEICE TRANSACTIONS on Electronics
SP - 1128
EP - 1133
AU - Hiroaki USUI
PY - 2000
DO -
JO - IEICE TRANSACTIONS on Electronics
SN -
VL - E83-C
IS - 7
JA - IEICE TRANSACTIONS on Electronics
Y1 - July 2000
AB - Polymeric thin films can be prepared by physical vapor deposition in several manners such as direct evaporation of the polymer, co-evaporation of two monomers followed by polyaddition or polycondensation reaction, or evaporation of single monomer followed by chain polymerization. The ionization-assisted deposition (IAD) was proposed as a new method of polymer deposition that has special features such as activation of polymerization reaction and aligning of the dipole orientation. These mechanisms were utilized for the formation of vinyl polymer and polyurea thin films aiming for such applications as organic light emitting diodes and piezoelectric devices.
ER -