The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
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The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
Filmes finos de Teflon AF 1600 foram preparados por um método de deposição assistida por elétrons (e-assist). A análise IR revelou que a deposição e-assist gera pequena quantidade de grupos polares como o ácido carboxílico na estrutura molecular dos filmes depositados. Os grupos polares contribuíram para aumentar a interação intermolecular e levaram a uma melhoria notável na força de adesão e robustez dos filmes, especialmente quando uma tensão de polarização foi aplicada ao substrato no decurso da deposição e-assistida. Os filmes de Teflon AF depositados por vapor tinham índices de refração de 1.35 a 1.38 e eram eficazes para revestimentos anti-reflexo. O uso da deposição e-assist aumentou ligeiramente o índice de refração como uma compensação para a melhoria da robustez do filme.
Soma YASUI
Tokyo University of Agriculture and Technology
Fujio OHISHI
Kanagawa University
Hiroaki USUI
Tokyo University of Agriculture and Technology
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Soma YASUI, Fujio OHISHI, Hiroaki USUI, "Vapor Deposition of Fluoropolymer Thin Films for Antireflection Coating" in IEICE TRANSACTIONS on Electronics,
vol. E106-C, no. 6, pp. 195-201, June 2023, doi: 10.1587/transele.2022OMP0006.
Abstract: Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.
URL: https://global.ieice.org/en_transactions/electronics/10.1587/transele.2022OMP0006/_p
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@ARTICLE{e106-c_6_195,
author={Soma YASUI, Fujio OHISHI, Hiroaki USUI, },
journal={IEICE TRANSACTIONS on Electronics},
title={Vapor Deposition of Fluoropolymer Thin Films for Antireflection Coating},
year={2023},
volume={E106-C},
number={6},
pages={195-201},
abstract={Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.},
keywords={},
doi={10.1587/transele.2022OMP0006},
ISSN={1745-1353},
month={June},}
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TY - JOUR
TI - Vapor Deposition of Fluoropolymer Thin Films for Antireflection Coating
T2 - IEICE TRANSACTIONS on Electronics
SP - 195
EP - 201
AU - Soma YASUI
AU - Fujio OHISHI
AU - Hiroaki USUI
PY - 2023
DO - 10.1587/transele.2022OMP0006
JO - IEICE TRANSACTIONS on Electronics
SN - 1745-1353
VL - E106-C
IS - 6
JA - IEICE TRANSACTIONS on Electronics
Y1 - June 2023
AB - Thin films of Teflon AF 1600 were prepared by an electron-assisted (e-assist) deposition method. IR analysis revealed that the e-assist deposition generates small amount of polar groups such as carboxylic acid in the molecular structure of the deposited films. The polar groups contributed to increase intermolecular interaction and led to remarkable improvement in the adhesion strength and robustness of the films especially when a bias voltage was applied to the substrate in the course of e-assist deposition. The vapor-deposited Teflon AF films had refractive indices of 1.35 to 1.38, and were effective for antireflection coatings. The use of e-assist deposition slightly increased the refractive index as a trade-off for the improvement of film robustness.
ER -