The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. ex. Some numerals are expressed as "XNUMX".
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The original paper is in English. Non-English content has been machine-translated and may contain typographical errors or mistranslations. Copyrights notice
A litografia de projeção de caracteres (CP) é utilizada para litografia sem máscara e é um potencial para a futura fabricação de máscaras fotográficas porque pode projetar ICs muito mais rápido do que a projeção de feixe pontual ou a projeção de feixe de formato variável (VSB). Neste artigo, apresentamos primeiro uma metodologia de desenvolvimento de conjunto de máscaras de projeção para sistemas de células múltiplas de colunas (MCC), em que células de colunas podem projetar padrões em paralelo com as litografias CP e VSB. A seguir, apresentamos um modelo INLP (programação não linear inteira), bem como um modelo ILP (programação linear inteira) para otimizar um conjunto de máscaras CP de um sistema de projeção MCC para que o tempo de projeção seja reduzido. Os resultados experimentais mostram que nossa otimização alcançou 33.4% menos tempo de projeção no melhor caso do que uma abordagem ingênua de desenvolvimento de máscara CP. Os resultados experimentais indicam que nosso método de otimização do conjunto de máscaras CP praticamente aumentou os objetos de padrão celular nas máscaras CP e diminuiu a projeção VSB, de modo que alcançou maior rendimento de projeção do que apenas paralelizar duas células de coluna com máscaras CP convencionais.
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Makoto SUGIHARA, Yusuke MATSUNAGA, Kazuaki MURAKAMI, "Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems" in IEICE TRANSACTIONS on Fundamentals,
vol. E91-A, no. 12, pp. 3451-3460, December 2008, doi: 10.1093/ietfec/e91-a.12.3451.
Abstract: Character projection (CP) lithography is utilized for maskless lithography and is a potential for the future photomask manufacture because it can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we first present a projection mask set development methodology for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and VSB lithographies. Next, we present an INLP (integer nonlinear programming) model as well as an ILP (integer linear programming) model for optimizing a CP mask set of an MCC projection system so that projection time is reduced. The experimental results show that our optimization has achieved 33.4% less projection time in the best case than a naive CP mask development approach. The experimental results indicate that our CP mask set optimization method has virtually increased cell pattern objects on CP masks and has decreased VSB projection so that it has achieved higher projection throughput than just parallelizing two column-cells with conventional CP masks.
URL: https://global.ieice.org/en_transactions/fundamentals/10.1093/ietfec/e91-a.12.3451/_p
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@ARTICLE{e91-a_12_3451,
author={Makoto SUGIHARA, Yusuke MATSUNAGA, Kazuaki MURAKAMI, },
journal={IEICE TRANSACTIONS on Fundamentals},
title={Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems},
year={2008},
volume={E91-A},
number={12},
pages={3451-3460},
abstract={Character projection (CP) lithography is utilized for maskless lithography and is a potential for the future photomask manufacture because it can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we first present a projection mask set development methodology for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and VSB lithographies. Next, we present an INLP (integer nonlinear programming) model as well as an ILP (integer linear programming) model for optimizing a CP mask set of an MCC projection system so that projection time is reduced. The experimental results show that our optimization has achieved 33.4% less projection time in the best case than a naive CP mask development approach. The experimental results indicate that our CP mask set optimization method has virtually increased cell pattern objects on CP masks and has decreased VSB projection so that it has achieved higher projection throughput than just parallelizing two column-cells with conventional CP masks.},
keywords={},
doi={10.1093/ietfec/e91-a.12.3451},
ISSN={1745-1337},
month={December},}
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TY - JOUR
TI - Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems
T2 - IEICE TRANSACTIONS on Fundamentals
SP - 3451
EP - 3460
AU - Makoto SUGIHARA
AU - Yusuke MATSUNAGA
AU - Kazuaki MURAKAMI
PY - 2008
DO - 10.1093/ietfec/e91-a.12.3451
JO - IEICE TRANSACTIONS on Fundamentals
SN - 1745-1337
VL - E91-A
IS - 12
JA - IEICE TRANSACTIONS on Fundamentals
Y1 - December 2008
AB - Character projection (CP) lithography is utilized for maskless lithography and is a potential for the future photomask manufacture because it can project ICs much faster than point beam projection or variable-shaped beam (VSB) projection. In this paper, we first present a projection mask set development methodology for multi-column-cell (MCC) systems, in which column-cells can project patterns in parallel with the CP and VSB lithographies. Next, we present an INLP (integer nonlinear programming) model as well as an ILP (integer linear programming) model for optimizing a CP mask set of an MCC projection system so that projection time is reduced. The experimental results show that our optimization has achieved 33.4% less projection time in the best case than a naive CP mask development approach. The experimental results indicate that our CP mask set optimization method has virtually increased cell pattern objects on CP masks and has decreased VSB projection so that it has achieved higher projection throughput than just parallelizing two column-cells with conventional CP masks.
ER -